This paper reports for the first time, the design features, performance and reliability evaluation of a new sipoxjte siposoxidejunction termination extensio.

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Semi‐insulating Polycrystalline Silicon Sipos Are Thin Sio X Films 0≤ X ≤2, Deposited By Means Of Low Pressure Chemical Vapor Deposition On Suitable Substrates Silicon Or Sapphire.

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